
US4585675A - Alumina silicon carbide, and silicon primary
US4585675A - Alumina silicon carbide, and silicon primary protective coatingswith a carrier liquid such as water, isopropyl alcohol and mixtures thereof
US4585675A - Alumina silicon carbide, and silicon primary protective coatingswith a carrier liquid such as water, isopropyl alcohol and mixtures thereof
The inventive method comprises chemically-mechanically polishing a substrate comprising at least one layer of silicon carbide with a polishing composition
This work describes the growth of silicon–silicon carbide nanoparticles (Si–SiC) and their self-assembly into worm-like 1D hybrid nanostructures
S. Yajima; Y. Hasegawa; J. Hayashi; M. Iimura, 1978: Synthesis of continuous silicon carbide fibre with high tensile strength and high Young's
A system includes a silicon carbide (SiC) semiconductor device and a hermetically sealed packaging enclosing the SiC semiconductor device. The hermetically
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Abstract: Silicon Carbide (SiC) is a promising cladding material for accident-tolerant fuel in light water reactors due to its excellent resistance to
A method for manufacturing a silicon carbide single crystal includes: packing a silicon carbide source material into a crucible, the silicon carbide source
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(PL) and steady-state PL excitation (PLE) measurements to study the size dependent optical properties of ultrasmall silicon carbide (SiC)
silicon carbide junction isolation electrode devices normally due to the absorption of water—which which this work contributes to the proof-of-
@ improved granular abrasive material (22) comprises silicon carbide particles (23) at least partially coated with an integral, durable surface layer (24)
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Download Citation on ResearchGate | Microstructural Characterization of Alumina and Silicon Carbide Slip‐Cast Cakes | The effect of solids loading, particle-
CA2408582A1 - Silicon carbide metal-semiconductor field effect transistors and methods of fabricating silicon carbide metal-semiconductor field effect transis
US6902964B2 - Methods of fabricating delta doped silicon carbide metal-semiconductor field effect transistors having a gate disposed in a double recess
Mirror Etching of Single Crystalline C-Face 4H-Silicon Carbide Wafer by Analysis of CNTFETs Operating in SubThreshold Region for Low Power Digital
Micropipe defects existing in a silicon carbide single crystal are closed within the single crystal. At least a portion of the micropipe defects opened
There are provided a continuous fiber-reinforced silicon carbide member and the like which allow sufficient improvement in a mechanical property and si
Silicon carbide polishing method utilizing water-soluble oxidizers The inventive method comprises chemically-mechanically polishing a substrate comprising at
Abstract: Amorphous silicon carbide (a-SiC) films are promising solution for functional coatings intended for harsh environment due to their superior
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